Boron nitride is a thermally and chemically resistant refractory compound of boron and nitrogen with the chemical formula BN.
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Boron nitride is a thermally and chemically resistant refractory compound of boron and nitrogen with the chemical formula BN.
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Boron nitride exists in multiple forms that differ in the arrangement of the boron and nitrogen atoms, giving rise to varying bulk properties of the material.
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Amorphous form of boron nitride is non-crystalline, lacking any long-distance regularity in the arrangement of its atoms.
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Cubic boron nitride has a crystal structure analogous to that of diamond.
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Wurtzite form of boron nitride has the same structure as lonsdaleite, a rare hexagonal polymorph of carbon.
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Boron nitride can be doped p-type with beryllium and n-type with boron, sulfur, silicon or if co-doped with carbon and nitrogen.
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The parts are made from boron nitride powders adding boron oxide for better compressibility.
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Thin films of boron nitride can be obtained by chemical vapor deposition from boron trichloride and nitrogen precursors.
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Boron nitride reacts with nitrides of lithium, alkaline earth metals and lanthanides to form nitridoborate compounds.
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Synthesis of c-BN uses same methods as that of diamond: cubic boron nitride is produced by treating hexagonal boron nitride at high pressure and temperature, much as synthetic diamond is produced from graphite.
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Materials with cubic boron nitride crystals are often used in the tool bits of cutting tools.
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Atomically thin boron nitride is one of the strongest electrically insulating materials.
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Atomically thin boron nitride has one of the highest thermal conductivity coefficients among semiconductors and electrical insulators, and its thermal conductivity increases with reduced thickness due to less intra-layer coupling.
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Atomically thin boron nitride has much better oxidation resistance than graphene.
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Atomically thin boron nitride has been found to have better surface adsorption capabilities than bulk hexagonal boron nitride.
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Atomically thin hexagonal boron nitride is an excellent dielectric substrate for graphene, molybdenum disulfide, and many other 2D material-based electronic and photonic devices.
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Nevertheless, the Raman intensity of G band of atomically thin boron nitride can be used to estimate layer thickness and sample quality.
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Boron nitride tubules were first made in 1989 by Shore and Dolan This work was patented in 1989 and published in 1989 thesis and then 1993 Science.
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Boron nitride nanotubes were predicted in 1994 and experimentally discovered in 1995.
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Boron nitride aerogel is an aerogel made of highly porous BN.
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Boron nitride is reported to show weak fibrogenic activity, and to cause pneumoconiosis when inhaled in particulate form.
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