Metal–oxide–semiconductor field-effect transistor is a type of field-effect transistor, most commonly fabricated by the controlled oxidation of silicon.
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Metal–oxide–semiconductor field-effect transistor is a type of field-effect transistor, most commonly fabricated by the controlled oxidation of silicon.
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Basic principle of the field-effect MOS transistor was first patented by Julius Edgar Lilienfeld in 1925.
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Basic principle of this kind of MOS transistor was first patented by Julius Edgar Lilienfeld in 1925.
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Structure resembling the MOS transistor was proposed by Bell scientists William Shockley, John Bardeen and Walter Houser Brattain, during their investigation that led to discovery of the transistor effect.
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CMOS transistor logic reduces power consumption because no current flows, and thus no power is consumed, except when the inputs to logic gates are being switched.
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Bipolar MOS transistor-based logic does not have such a high fanout capacity.
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The JFET and bipolar junction MOS transistor are preferred for accurate matching, higher transconductance and certain temperature characteristics which simplify keeping performance predictable as circuit temperature varies.
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The P-MOS transistor switch passes all voltages higher than Vgate - Vtp .
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The FETs have their drains and sources connected in parallel, the body of the P-MOS transistor is connected to the high potential and the body of the N-MOS transistor is connected to the low potential .
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For voltages between VDD - Vtn and gnd - Vtp, both FETs conduct the signal; for voltages less than gnd - Vtp, the N-MOS transistor conducts alone; and for voltages greater than VDD - Vtn, the P-MOS transistor conducts alone.
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Also, the P-MOS transistor is typically two to three times wider than the N-MOS transistor, so the switch will be balanced for speed in the two directions.
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The voltage rating of the MOS transistor is a function of the doping and thickness of the N-epitaxial layer, while the current rating is a function of the channel width .
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