10 Facts About Thin-film deposition

Since the fluid surrounds the solid object, Thin-film deposition happens on every surface, with little regard to direction; thin films from chemical Thin-film deposition techniques tend to be conformal, rather than directional.

Chemical Thin-film deposition is further categorized by the phase of the precursor:.

In semiconductor manufacturing, an advanced form of electroplating known as electrochemical Thin-film deposition is used to create the copper conductive wires in advanced chips, replacing the chemical and physical Thin-film deposition processes used to previous chip generations for aluminum wires.

Chemical vapor Thin-film deposition generally uses a gas-phase precursor, often a halide or hydride of the element to be deposited.

Physical Thin-film deposition uses mechanical, electromechanical or thermodynamic means to produce a thin film of solid.

Since most engineering materials are held together by relatively high energies, and chemical reactions are not used to store these energies, commercial physical Thin-film deposition systems tend to require a low-pressure vapor environment to function properly; most can be classified as physical vapor Thin-film deposition.

Cathodic arc Thin-film deposition which is a kind of ion beam Thin-film deposition where an electrical arc is created that literally blasts ions from the cathode.

Electrohydrodynamic deposition is a relatively new process of thin-film deposition.

Thin-film deposition technologies are being developed as a means of substantially reducing the cost of solar cells.

Thin-film deposition printing technology is being used to apply solid-state lithium polymers to a variety of substrates to create unique batteries for specialized applications.