An IGBT cell is constructed similarly to an n-channel vertical-construction power MOSFET, except the n+ drain is replaced with a p+ collector layer, thus forming a vertical PNP bipolar junction transistor.
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An IGBT cell is constructed similarly to an n-channel vertical-construction power MOSFET, except the n+ drain is replaced with a p+ collector layer, thus forming a vertical PNP bipolar junction transistor.
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IGBT began fabricating the IGBT device with the assistance of Margaret Lazeri at GE in 1978 and successfully completed the project in 1979.
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Development of IGBT was characterized by the efforts to completely suppress the thyristor operation or the latch-up in the four-layer device because the latch-up caused the fatal device failure.
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The device had an overall similar structure to Baliga's earlier IGBT device reported in 1979, as well as a similar title.
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IGBT is characterized by its ability to simultaneously handle a high voltage and a large current.
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The IGBT is the most rugged and the strongest power device yet developed, affording ease of use and so displacing bipolar transistors and even GTOs.
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Non-latch-up IGBT operation was ensured, for the first time, for the entire device operation range.
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The IGBT is widely used in consumer electronics, industrial technology, the energy sector, aerospace electronic devices, and transportation.
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IGBT combines the simple gate-drive characteristics of power MOSFETs with the high-current and low-saturation-voltage capability of bipolar transistors.
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The IGBT combines an isolated-gate FET for the control input and a bipolar power transistor as a switch in a single device.
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The IGBT is used in medium to high-power applications like switched-mode power supplies, traction motor control and induction heating.
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Detail of the inside of a Mitsubishi Electric CM600DU-24NFH IGBT module rated for, showing the IGBT dies and freewheeling diodes.
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